NFTS-VI
Facing target sputtering system with two targets equipped with a load-lock chamber using RF/DC pulse
power supply
FTS Corporation
NFTS-V
Facing target sputtering system with seven targets equipped with a load-lock chamber
FTS
Corporation
NFTS-IV
Facing target sputtering system with seven targets equipped with a load-lock chamber
FTS
Corporation
NFTS-II
Facing target sputtering system with eight sputtering sources with a substrate heater capable to heat
samples up to 700 degC.
FTS Corporation
Multiple source film deposition system
RF sputtering, thermal evapolator
KITANO SEIKI
Shared facilities
Ultra-high vacuum sputtering system
Magnetron sputtering
RF reactive sputtering
Molecular Beam Epitxy
Achievable pressure in growth chamber : Below 1×10^-6Pa
KITANO SEIKI
Infrared lamp typed rapid thermal annealing system
High-speed heating and cooling
Annealing temperature: RT~900℃
ULVAC
Ion milling
Dry etcher
HAKUTO
MPMS with EverCool
SQUID
Magnetic field: up to 7 T
Temperature: 2 to 400 K
Quantum Design社
Shared facilities
In-plane and polar magnetic domain observation system
In-plane and perpendicular magnetic domain observation microscope for still and video magnetic domain
observation
NEO ARK
LT-MR measurement setup No. 1
Cryogenics
RT-1.5K, 3T SC magnet
LT-MR measurement setup No. 2
Magnetic field : up to 2500 Oe
Temperature : 10 K ~ RT
Cryogenic system
Cryogenics temperature sensor
Temperature: 4.2K~ RT
Lake Shore