(Last Updated on 28, Mar, 2005)
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Member Introduction


In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method.
The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition.


Department of Physical Electronics,
Faculty of Engineering,
Tokyo Institute of Technology

    2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN

O-okayama the South Third Building 7F
Room 709(Assoc.Prof.'s) Phone: +81-3-5734-3564
Room 708(Students') Phone: +81-3-5734-2513

FAX : +81-3-5734-2513

Please send your message!
Tokyo Institute of Technology Home Page

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If you have any questions or problems, please contact to spin-admin@spin.pe.titech.ac.jp, the System Operator of this NAOE Lab.'s Home Page.