(Last Updated on 28, Mar, 2005)


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Member Introduction





In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method.

The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition.






Department of Physical Electronics,


Faculty of Engineering,

Tokyo Institute of Technology


    2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN
 

    O-okayama the South Third Building  7F

        Room 709(Assoc.Prof.'s)  Phone: +81-3-5734-3564

        Room 708(Students')      Phone: +81-3-5734-2513

 

                                 FAX  : +81-3-5734-2513



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Tokyo Institute of Technology Home Page




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If you have any questions or problems, please contact to spin-admin@spin.pe.titech.ac.jp, the System Operator of this NAOE Lab.'s Home Page.