(Last Updated on 28, Mar, 2005)
In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method.
The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition.
2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN
O-okayama the South Third Building 7F
Room 709(Assoc.Prof.'s) Phone: +81-3-5734-3564
Room 708(Students') Phone: +81-3-5734-2513
FAX : +81-3-5734-2513
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